Technometrics: A journal of statistics for the physical, chemical and engineering sciences

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  Año 2010, Vol. 52, Número 3

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    Nonparametric Profile Monitoring by Mixed Effects Modeling.

    Peihua Qiu, Changliang Zou, Zhaojun Wang

    págs. 265-276

    
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    Nonparametric Profile Monitoring by Mixed Effects Modeling. Comment.

    Daniel W. Apley

    págs. 277-279

    
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    Nonparametric Profile Monitoring by Mixed Effects Modeling. Comment.

    Hugh A. Chipman, R. Jock MacKay, Stefan H. Steiner

    págs. 280-282

    
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    Nonparametric Profile Monitoring by Mixed Effects Modeling. Comment.

    F. Tsung

    págs. 283-284

    
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    Nonparametric Profile Monitoring by Mixed Effects Modeling. Comment.

    William H. Woodall, Jeffrey B. Birch, Pang Du

    págs. 285-287

    
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    Nonparametric Profile Monitoring by Mixed Effects Modeling. Rejoinder.

    Peihua Qiu, Changliang Zou, Zhaojun Wang

    págs. 288-293

    
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    Leveraged Gauge R&R Studies.

    Ryan Browne, Jock MacKay, Stefan Steiner

    págs. 294-302

    
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    One-Sided Tolerance Limts for Balanced and Unbalanced Random Effects Models.

    David Hoffman

    págs. 303-312

    
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    Approximate Tolerance Limits Under Log-Location-Scale Regression Models in the Presence of Censoring.

    Takesi Emura, Hsiuying Wang

    págs. 313-323

    
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    Bayesian Reliability, Availability, and Maintainability Analysis for Hardware Systems Described Through Continuous Time Markov Chains

    Javier Cano, Javier Martínez Moguerza , David Ríos Insua

    págs. 324-334

    
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    Improving on Estimation for the Generalized Parelo Distribution.

    Jin Zhang

    págs. 335-339

    
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    Likelihood Analysis of Multivariable Probit Models Using a Parameter Expanded MCEM Algorithm.

    Huiping Xu, Bruce A. Craig

    págs. 340-348

    
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    Some Notes on the Nonnegative Garrote.

    Shifeng Xiong

    págs. 349-361